Zeiss EC Plan-Neofluar 40x/1.30 Oil Immersion Objective (NA 1.30, Infinity, M27) ZEISS Semiconductor wafer and large substrate

Semiconductor wafer and large substrate inspection

designed to allow the operator to control motorized microscope functions — including focus drive

preventing movement during observation and allowing systematic scanning of the slide without losing specimen position

The working distance of approximately 10 mm gives users practical space to focus under different sample conditions and to use auxiliary tools without risking contact with the lens

providing numerical apertures of 1

Zeiss EC Plan-Neofluar 40x/1.30 Oil Immersion Objective (NA 1.30, Infinity, M27) ZEISS Semiconductor wafer and large substrateThe Zeiss EC Plan Neofluar 40 1. 30 Oil Immersion Objective is a high performance fluorite oil immersion objective from Zeisss EC (Enhanced Contrast) Plan Neofluar series delivering NA 1. 30 resolution with minimized stray light and enhanced contrast across all imaging modalities including brightfield, darkfield, phase contrast, DIC, fluorescence, and polarization. Offered here in lightly used condition with perfect optics at significant savings