Nikon TU Plan ELWD 50x Brightfield Darkfield Objective UMPLFLN20XW Once positioned

Once positioned

Achieve versatile multi-mode imaging with extended working distance for water immersion microscopy

2 rotatable Filter Size 32mm Rotatable Positions 2 (allow in-path angular adjustment of installed element) Country of Origin Japan HS Code 901190 Condition New / OEM Universities and research institutions are welcome to purchase using an official purchase order

Integration with image analysis and measurement software

PLAN 2X OBJECTIVE - WORKING DISTANCE: 34MM

Nikon TU Plan ELWD 50x Brightfield Darkfield Objective UMPLFLN20XW Once positionedNikon TU Plan ELWD 50x 0. 60 EPI D Objective Extra Long Working Distance Exceptional 11mm working distance ideal for thick specimens and inspection tasks Dual mode capability: brightfield and darkfield (EPI D) illumination Infinity corrected optics for modern Nikon industrial microscope systems Optics are flawless. Light signs of use on outer metal barrel save 52% vs. new list price of $4,995 Product Description The Nikon TU Plan ELWD 50x 0. 60 EPI D