Olympus MPlanFL N 20X Epi Objective | 0.40 NA, BD, Infinity Corrected MICROSCOPES 173 and surface anomalies

and surface anomalies

Semiconductor wafer probing and testing

identifying minerals

and fluorescence imaging of living cells in thick vessels

Color Correction

Olympus MPlanFL N 20X Epi Objective | 0.40 NA, BD, Infinity Corrected MICROSCOPES 173 and surface anomaliesPremium 20 objective with brightfield and darkfield capability ideal for industrial inspection and materials science applications. 20 Magnification, NA 0. 45 High resolution for detailed imaging and defect detection. Brightfield Darkfield (BD) Capability Dual mode imaging for enhanced contrast and defect detection on reflective surfaces. Working Distance (3 mm) Adequate clearance for standard industrial specimens. MPLFLN Plan Semi Apochromat Design